Abstract
Ferromagnetic resonance (FMR) technique is used to investigate the effect of oxygen partial pressure (PO2) and substrate temperature (TS) on the defect properties of Ni0.65Zn0.35Al0.8Fe1.2O4 (NZAFO) thin films. NZAFO thin films are deposited on MgAl2O4 (MAO) (100) substrates using pulsed laser deposition technique under various PO2 and TS. The FMR study reveals that the FMR parameters such as linewidth, line intensity and g-factor of the NZAFO thin films are sensitive to the variations in PO2 and TS. The observed changes in the FMR parameters are attributed to the variation of density and uniformity of defects in NZAFO thin films. Thus the significance of the present work suggests that the FMR may serve as an effective tool to monitor the growth condition of complex oxide films.
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