Effect of plasma treatment on the seed germination and seedling growth of radish (Raphanus sativus)

Abstract

The effect on the germination and seedling growth of radish (Raphanus sativus) seeds were examined employing a dielectric barrier discharge (DBD) at atmospheric pressure and room temperature for various treatment time. DBD plasma using argon gas of flow rate 2 l m−1 was employed in this study. Radish seeds were treated with DBD plasma for 1–5 min, respectively. Germination characteristics, seedling growth parameters, the contact angle of the seed coat, water uptake capacity, mass loss, the temperature of the seeds, chlorophyll, and carotenoid contents of the seedlings were measured before and after the DBD plasma treatments. Plasma treatment of radish seeds significantly increased germination-related characters, including germination percentage, fresh and dry weight, vigor index, and total carotenoids contents. However, the cumulative production rate was found to be decreased. Results from the experiment indicate an acceleration in the water uptake of the radish seeds and make the seed surface hydrophilic by plasma treatment. Scanning electron microscopy analysis showed that etching effects on the seed coat occurred after the argon plasma treatments, which affected the wettability of the radish seed. The experimental findings showed that seeds being treated by DBD plasma for 2 and 3 min had a positive effect on the germination and seedling growth of radish.