Abstract
In the present work, multifunctional Ti-Si-N coatings have been deposited using CAVD method with the aim of studying their chemical, physical, structural and mechanical properties. Coatings of Ti-Si-N were modified by high-intensity ion implantation using copper ions with dose D=2×1017ions/cm2 and energy E=60keV. The results demonstrated that ion implantation has an effect on the grain size, hardness, and Young modulus of the Ti-Si-N coating. Additionally, the effect of Cu implantation on the bioactive properties of coatings was investigated by contact antimicrobial essay. The results show a high release of Cu ions in the cultivation liquid and the low efficiency of the <20% Cu doping towards E. coli bacteria. Our results bring understanding to the low dosage ion implantation of multifunctional surfaces towards applications and general drawbacks of ion implantation as bioactive tailoring method.
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