Effect of Humidity and UV Assistance on the Properties of Erbium Doped Yttrium Oxide Films Prepared by Aerosol‐MOCVD

Abstract

AbstractErbium‐doped yttrium oxide films are prepared from yttrium acetylacetonate (Y(C5H7O2)3) and erbium (III) tris(2,2,6,6‐tetramethyl‐3,5‐heptanedionate) (Er(TMHD)3) under standard conditions by UV‐aerosol‐assisted metal‐organic (AA‐MOCVD), using air with controlled humidity as the carrier gas. The structure and deposition rate are optimized by studying three experimental parameters; substrate temperature, relative humidity (RH) of the carrier gas, and UV‐assistance. Taking all these parameter effects under consideration, the maximum deposition rates are reached under low humidity air and with UV‐assistance. Nevertheless, as‐deposited Er:Y2O3 films crystallize in the Y2O3 cubic structure and present a very low organic contamination when depositions take place under high air humidity and with UV‐assistance. The refractive index of yttrium oxide films under these conditions are relatively high, reaching 1.86 when deposited at 410 °C.