Abstract
The synergistic effect of high voltage discharge non-thermal plasma (NTP) and photocatalysts on contaminant removal has repeatedly confirmed by plenty of researches. Most previous plasma-photocatalyst synergistic systems focused on the utilization of the ultraviolet light but ignored the visible light generated by high voltage discharge. Graphitic carbon nitride (g-C3N4), a metal-free semiconductor that exhibits high chemical stability, can utilize both the ultraviolet and visible light from high voltage discharge. However, the synergistic system of NTP and g-C3N4 has been researched little. In this paper, the effect of NTP generated by dielectric barrier discharge (DBD) on g-C3N4 is studied by comparing the photocatalytic activities, the surface physical structure and the surface chemical characteristics of pristine and plasma treated g-C3N4. Experimental results indicate that the DBD plasma can change the physical structure and the chemical characteristics and to further affect the photocatalytic activity of g-C3N4. The effect of NTP on g-C3N4 is associated with the discharge intensity and the discharge time. For a long time scale, the effect of NTP on g-C3N4 photocatalysts presents a periodic change trend.
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