Abstract
Abstract Polarization switching and energy storage properties of a series of Pb 0.97 La 0.02 Zr 0.95 Ti 0.05 O 3 (PLZT) thin films deposited on (100)-textured LaNiO 3 (LNO)-buffered Si substrates and (111)-textured Pt/Ti/SiO 2 /Si substrates were investigated. It was revealed that the PLZT films deposited on the (100)-textured LNO-buffered Si substrates prefer the (100) textured structure, while the orientation of the films deposited on the (111)-textured Pt-coated Si substrates is random. With respect to the films on the Pt-coated Si substrates, the (100) textured PLZT films have bigger compressive residual stress, larger electrical polarization, better dielectric properties, and better energy storage performances. For the (100)-orientated PLZT films, the energy density ( W s ) and efficiency ( η ) measured at room temperature are about 15.3 J/cm 3 and 56% respectively. Moreover, the better frequency stability in the range from 20 Hz to 10 kHz, and temperature stability in the range from 25 to 270 °C are demonstrated in the (100)-orientated PLZT films. These results indicate that the PLZT films with LNO bottom electrode could be potential candidate for applications in high energy storage density capacitors.
Published Version
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