Effect of 172-nm UV irradiation on polyimide and its application in surface modification by grafting

Abstract

Polyimides (PIs) have a wide range of industrial and scientific applications due to their excellent thermal and mechanical stability and chemical resistance. Their response to ultraviolet (UV) irradiation is of further interest in high-value applications such as spacecraft technology and electronics packaging. In this work, we investigated the effect of 172-nm UV xenon excimer lamp irradiation on samples of pyromellitimido-oxydianiline (PMDA-ODA) commercial films in the absence of oxygen. The average irradiance received at the sample position was 90 mW/cm2, and the total radiation dosage varied from 0 to 64 J/cm2. X-Ray photoelectron spectroscopy, time-of-flight-secondary ion mass spectrometry, atomic force microscopy, and contact angle measurements were used to characterize the effect. Calculated UV-visible spectroscopy absorption spectra were obtained using the ZINDO//B3LYP/3-21G method to give an indication of which orbitals are involved in the transitions near 172 nm. The reactivity of the different UV-treated PI samples toward nitrogen-borne heptafluorodecene vapor was then investigated using the above techniques. Grafting reactions occurred on the surface of the photochemically activated polymer. This study explored the potential for modification of PI surfaces using UV-light-assisted grafting to impart valuable functionalities.