Abstract
This paper presents an improved dynamical modeling method for the double parallelogram mechanism (DPM) based motion stage with a large workspace, where the impacts of intermediate stages are considered. According to the mode shape analysis of the DPM by the Euler-Bernoulli beam theory, it is observed that the high order modes induced by the intermediate stages have significant impacts on the dynamical behavior of the DPM. With this in consideration, the matrix displacement method is applied to the modeling of the DPM based compliant stage, where the intermediate stages of DPMs are regarded as nodes with masses. Correspondingly, an improved dynamical model is proposed to better describe the complicated dynamical characteristics of the compliant stage, which is further verified by finite element analysis (FEA) and experiments on a prototype. Compared with existing methods, the proposed dynamical model offers a new look into the kinetostatic analysis and dynamical design of the compliant mechanism-type micro/nanostage.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
