Double ferromagnetic barriers resonant tunneling diodes (RTD) based on the surface of a topological insulator

Abstract

Resonant tunneling diodes (RTDs), which are based on double barrier quantum well structures, are typically achieved by combining different materials with varying band gap sizes. However, this approach often poses challenges such as material mismatching and dislocations. In this study, we present a novel resonant tunneling diode scheme utilizing the unique properties of topological insulator materials. Specifically, we exploit the gap opening in the band structure of the topological insulator by employing perpendicular magnetization. In this proposed RTD platform, the barrier regions are formed from a ferromagnetic topological insulator through the proximity effect. By adjusting the thickness and spacing of the ferromagnetic barriers, a well region with confined states emerges between the barrier regions. Theoretical analysis reveals that by tuning the back gate voltage, the I-V characteristics exhibit two significant behaviors: negative differential resistance (NDR) and step-like behavior for Fermi energy values of EF = −3 and EF = 3, respectively. Furthermore, we observe an increase in the peak-to-valley ratio (PVR) with higher magnetization values. Notably, the PVR reaches a value of 7.13 for a magnetization value of m = 9. Additionally, we investigate the influence of the well width and barrier thickness on the transport properties of the device.