Abstract
In this paper, we present a two-dimensional simulation study of a dopingless PNPN TFET with a hetero-gate dielectric. Using a dual-material-gate in a dopingless TFET, the energy band gap on the source side is modulated to create an N+ source pocket. Our technique obviates the need to use ion implantation for the formation of the N+ source pocket. The dopingless PNPN TFET with a hetero-gate dielectric is demonstrated to exhibit a superior performance in terms of ON-state current and subthreshold swing when compared to a conventional dopingless TFET. Our results may pave the way for realizing high performance dopingless TFETs using a low thermal budget required for low power and low cost applications.
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