Abstract
Successful imaging of patterns with critical dimensions less than 45nm with extreme ultraviolet lithography (EUVL) requires stringent controls on all sources of image placement (IP) errors. Among the potential sources of IP error is the mechanical distortion of the patterned mask when mounted in the exposure tool. An EUVL reticle can exhibit both in-plane distortion and out-of-plane distortion due to the presence of debris lodged between the mask and the electrostatic chuck. Even particles with a compressed height as small as 100nm have the potential to consume a significant portion of the IP error budget. To alleviate this problem, a thorough understanding of the response of the reticle∕particle∕chuck system during electrostatic chucking is essential. This article describes experimental indentation testing to characterize relevant nanoscale material properties and the subsequent use of the data in finite element models that simulate the system response under typical chucking conditions.
Published Version
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