Abstract
An analytical technique for measuring the permeation rate of chlorine-tagged organic solvents through thin polymer films on low-k porous dielectrics was developed. All samples consisted of a silicon substrate with 450nm thick porous silicon oxicarbide overlayer. The porous layers of some samples were sealed by a 17nm thick chemical vapor deposited polymer (parylene X) film. Samples were exposed to liquid 3-chloro-1-propanol at room temperature and pressure. The chlorine atom on the propanol molecule was used as a marker, enabling Rutherford backscattering spectrometry analysis to determine the total amount of chemical penetration into the porous layer as a function of the exposure time. Solvent penetration into the sealed porous material increased linearly for exposure times of less than 30min. Exposures over 30min saturated the sealed samples with 10.5μgofsolvent∕cm2. The permeation rate of 3-chloro-1-propanol through the 17nm parylene X layer was approximately 6.5×10−3μg∕cm2s.
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