Abstract
We describe a direct measurement of the image blur and defocus induced by Coulomb effects (stochastic and global space charge) in electron beam projection lithography. The Nikon 100 kV electron beam projection experimental column was used for the experiments. This column has similar values of electron optical parameters to those of electron beam projection lithography (EPL) systems. The Coulomb effect image blur and defocus were directly measured by a knife-edge method. The experimental data of Coulomb effect image blur and defocus as functions of beam current are shown. The experimental results show excellent agreement with our Monte Carlo simulation results.
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