Abstract
This paper presents the development of mechanically active arrays, which consist of free-standing Ti beam cantilevers with an integrated NiFe cube with critical dimensions of 100nm allowing for control by an external magnetic field gradient. A process flow is investigated based on two-step electron-beam lithography and reactive ion etching combined with magnetron sputtering of the functional magnetic nanostructures. A sacrificial layer technology is developed for dry etching of Ti anisotropically and Si isotropically at the same time. The saturation magnetization of the deposited NiFe is 0.78T giving rise of magneto-static forces in order of pN. AFM and MFM measurements confirm the size and position of the magnetic cubes.
Published Version
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