Abstract
R & D project of high current metal ion beam technology is being carried out for use in material surface modification and new material formation by means of ion implantation. Present results of the R & D are as follows. (1) A multicusp high temperature metal ion source with an operation temperature of 2000 degrees K was attained using heat reflectors in the ion source discharge chamber. (2) Extracted ion beam currents of Al, Cr, Si and Ti were more than 100mA. (3) Al ion beam could be accelerated up to 90keV yielding 50mA on the target.
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