Abstract

Liquid crystal displays (LCDs) with Ga-doped ZnO (GZO) transparent electrodes on RGB color filters were fabricated to demonstrate the feasibility of using this new material as an alternative to indium tin oxide (ITO) electrodes. The process flow for fabricating LCDs with GZO electrodes was entirely compatible with that for commercially available LCDs using ITO electrodes. Concurrently, photolithography processing and wet-chemical etching techniques for the formation of GZO transparent electrodes on thin film transistor (TFT) arrays in LCD panels was developed. Fine-patterns of GZO with 2-μm line widths were successfully formed using lithography and wet -etching technology with a weakly acidic etchant of pH 5.5–6.8.

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