Abstract
Two different types of high current ion beam technologies are being developed. The high energy sheet ion beam system aiming at uniform irradiation for large material surface is expected to provide a thin and wide ion beam of more than 50 cm in width at 100 keV and the current of 2 A. The low energy ion beam deposition system is expected to produce mass analyzed ion beam current of 5 mA at the energy lower than 100 eV.
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