Abstract
The authors report an approach that has potential to fabricate dense structures without liquid development. Two kinds of positive tone electron beam resist, 950k PMMA and ZEP 520A (Nippon Zeon), were studied for their properties and behaviors while subjecting them to exposure, thermal development, and reactive ion etching. So far, we have successfully patterned 70 nm half-pitch gratings in both 950k PMMA and ZEP 520A without liquid development.
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