Abstract
Measurements have been made of the thickness and refractive index of various kinds of oxide films on silicon, using a split-beam ellipsometer. The principles of the method are described with special emphasis on the ease with which measurements can be taken and interpreted. Measurements of film thickness were taken at different wavelengths and showed excellent consistency. The variation of the refractive index of silicon oxide films with composition was investigated, and was found to have a discontinuity in slope.
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