Features of determination of thickness of dielectric films obtained in searching experiments

Abstract

The approach to determination of the thickness and the refractive indices of dielectric films obtained in searching experiments is discussed. Experiments of this kind often exhibit unpredictable values of thickness and refractive indices of films. Nondestructive noncontact methods of spectrophotometry and ellipsometry not involving preliminary preparation of samples are applied. The approach to determination of the thickness and the refractive indices of films is illustrated by means of samples of silicon carbonitride films obtained on silicon substrates by plasma-chemical decomposition of gas-phase trimethyl(phenylamino)silane.