Abstract
A method for determining the variations of sputtering yield of multicomponent target based on studies of time characteristics of the sputtered particles flux has been proposed and tested on an example of the angle dependence of sputtering yield. Time dependences of variation in the fluxes of the sputtered atoms of multicomponent oxides at different incidence angles of Ar ions were studied. Angular dependences of the sputtering yield for these compounds were obtained by direct measurements and computations. It has been shown that the angular dependence of the sputtering yield in a stationary mode can be obtained from the time dependences of the fluxes of the sputtered particles.
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