Abstract
There are several ways in which sputter-etching can cause interpretational difficulties when depth profiling in Auger electron spectroscopy. This paper discusses the effects on surface topography of a non-uniform ion beam current and the dependence of sputtering yield on ion incidence angle and surface composition. A three-dimensional theory is given which can be used to account for these effects and which leads to some conclusions concerning the optimum conditions for composition-depth profiling.
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