Abstract
Raman scattering, X-ray photoemission spectroscopy (XPS), Fourier transform photocurrent spectroscopy (FTPS), Rutherford backscattering (RBS) and electron paramagnetic resonance (EPR) method have been used for characterization of diamond layers deposited by microwave plasma enhanced chemical vapor deposition (MWPECVD). As substrates, thick silicon wafers pretreated by the mechanical seeding have been used, surrounded by the molybdenum ring. Here we report how this configuration can lead to the Mo contamination of diamond layers (similar effect to the well known contamination of diamond by Si) and we study the optical spectra related to the presence of molybdenum and other impurities over the bulk of deposited layers. Mo contamination was confirmed by XPS measurements, but we were not able to detect it by RBS and EPR.
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