Abstract

Mechanically probing test systems for the electrical testing of microwiring substrates are reaching their technological and economic limits. An electron beam test system for testing microwiring substrates is presented as an alternative. In contrast to other methods it uses only one primary energy for charging networks and reading their voltage, which results in a simpler instrumentation. The primary energy of 10 keV allows reliable charging of all relevant materials. The pad voltage is read by analyzing the energy of the generated electrons to indicate shorts and opens in the networks. An electron probe of 40 μm diameter can be positioned with a fast electrostatic deflection system to an accuracy of 10 μm on an area of 10×10 cm2 in a current laboratory system. Microwiring substrates with pads down to 100 μm in size can be tested. The test is based on CAD data without restrictions on the layout. Experimental results show reliable fault capture.

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