Abstract
The LIGA process is based on deep-etch lithography with synchrotron radiation, electroforming and plastic molding. This process allows three-dimensional microstructures to be fabricated from a variety of materials. By means of a sacrificial layer technique freely movable oscillating and rotating microstructures have been fabricated. The potential of the LIGA technology is demonstrated by the presentation of components for integrated optics, bandpass and highpass filters for the far infrared, acceleration sensors, and microgears.
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