Abstract
We developed the LIGA (Lithographie or lithography/Galvanoformung or electroforming/Abformung or molding) process using a compact synchrotron radiation (SR) source. To make a compact SR source applicable for the LIGA process, we developed a highly sensitive resist and highly transparent mask for deep SR lithography. We commercialized two devices, a piezoelectric composite and a microprobe for IC testing. A microconnector and optical switch were also developed.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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