Deposition of TiN and Ti(O,C,N) hard coatings by a plasma assisted chemical vapor deposition process

Abstract

Using conventional plasma nitriding equipment with a dc power supply, TiN coatings have been deposited from TiCl4, H2, N2, and Ar onto tool steel substrates at temperatures about 500 °C. Coatings of the type Ti(O,C,N) have also been deposited using an organic titanium compound instead of TiCl4. The advantage of this compound is the absence of any chlorine products in the deposited layers.