Abstract
Amorphous tantalum oxide films have been prepared by the ArF excimer laser photodissociation of Ta(OC 2H 5) 5 in the presence of N 2O. Film formation is observed at substrate temperatures above 150 °C. The film thickness reaches a maximum at substrate temperatures around 200 °C, and then it has a tendency to decrease slightly with temperature. The refractive indices of the films change from 1.85 to 2.30 when the substrate temperature is raised from 150 °C to 300 °C. O( 1D) atoms produced from photolysis of N 2O contribute significantly to the formation of tantalum oxide films.
Published Version
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