Abstract
AbstractThin films of nickel sulfide (NiS1.03, NiS2,α‐Ni7S6, or mixtures thereof) and palladium sulfide (PdS, Pd16S7, Pd4S, or mixtures thereof) have been prepared by aerosol‐assisted (AA)CVD using dithiocarbamate precursors of the type M(S2CNRR')2 (M = Ni, Pd; RR' = Et2, MeEt, MenBu, or MenHex). The solid‐state structure of Ni(S2CNMenBu)2, was determined by X‐ray single‐crystal diffraction and is characteristic of known nickel dithiocarbamates. Films were grown on glass substrates at temperatures of 400–525 °C and characterized by X‐ray diffraction (XRD), energy dispersive analysis of X‐rays (EDAX), and scanning electron microscopy (SEM).
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