Abstract
Cathodic arc evaporation is the most versatile PVD coating technology. The process uses arc evaporation to create highly ionized plasma. This permits adherent coatings to be applied to the low temperature substrates. The results of a study of the Zr–ZrO 2 thin films deposition process and the technological development of cathodic arc are presented there. The studies of the oxygen flow influence and of the substrate position on film deposition were carried out. The special substrate position in the chamber allows escaping “droplets” or macros and macro particles on the coating. ZrO 2 film with nano Zr inserts is obtained in some special cases. The Zr–ZrO 2 thin films were deposited on glass substrates after complete analysis of the arc deposition process. The structure and film optical properties were investigated by XRD, spectrophotometry, respectively. Other materials and composites can be deposited on the basis of these results.
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