Abstract
Deposition of inclined anisotropy film for bit-patterned media was studied using oblique incidence collimated sputtering. Co-Pt20 films with a thickness of 10 nm deposited on an annealed Pt/Ru under layer exhibited an inclination angle of the anisotropy axis of around 10° from the film normal corresponding to that of crystalline orientation. The anisotropy field and the inclination angle were estimated by comparing measured hysteresis loops with simulated loops. The estimated anisotropy field of the film, μ0Hκ, was around 1.2 T which indicated an expected anisotropy energy density of 6×105 J/m3. It was indicated that oblique incidence collimated sputtering is useful to fabricate inclined anisotropy recording media with high anisotropy.
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