Abstract
The magnetic properties of Si/Ru(t nm)/Fe90Co10 (3.0 nm)/Ru (4.0 nm) films with obliquely sputtered Ru underlayers were studied as a function of Ru underlayer thickness (t). It was found that an obliquely sputtered Ru underlayer produces high uniaxial anisotropy in the Fe90Co10 layer with extremely small hysteresis in the hard axis direction. The anisotropy field can be increased by increasing Ru underlayer thickness. X-ray reflectometry showed that the interfaces of the samples were quite smooth with rms roughness as small as 0.35 nm. The high uniaxial anisotropy of the samples shows high thermal stability and endures e-beam lithography for microscopic device fabrication. We discuss the origin of this high anisotropy in terms of a magnetostatic effect arising from an anisotropic surface morphology.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
