Abstract
We investigated the magnetic properties of multilayer stacks of Ni81Fe19 thin films separated with SiO2 intended for use in inductors operating at sub-GHz frequencies. We measured saturation magnetization, anisotropy field, coercivity, and complex permeability of sputtered multilayer structures consisting of thin film stacks of 5, 10, 15, 20, and 25 layers, ranging from 160 to 1455 nm in total magnetic material thickness. Our analysis indicates that multilayer stacks composed of repeated layers thinner than 115 nm generally maintained the desired magnetic properties found in individual thin films, such as high permeability, low anisotropy, and low coercive field. Moreover, the multilayer stacks did not exhibit unwanted characteristics such as stripe domain formation and decreased value of real permeability, which commonly occurred in single thicker films. These properties make them suitable for on-wafer inductor applications.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
