Deposition of BN films on metal substrates from a fluorine-containing plasma

Abstract

Boron nitride (BN) films were deposited on Mo, W, Ni, Ti and Zr substrates by DC arc jet chemical vapor deposition using a gas mixture of Ar–N 2–BF 3–H 2 at 50 Torr, a substrate temperature of 850–1150 °C, and a − 85 V substrate bias. Cubic BN (c-BN) films showing clear c-BN Raman peaks were obtained on Mo and W, but they did not adhere well to the substrates. Hexagonal or turbostratic BN was deposited predominantly on Ni substrates, which is similar to the preferable deposition of graphitic carbons in diamond CVD. High quality c-BN films with good adhesion were obtained on Ti and Zr. The reasons for these differences among metal substrates are discussed.