Abstract

In this paper, the performance of sequential dual-band mid-wavelength N+-n-p-p-P+-p-p-n-n+ back-to-back HgCdTe photodiode grown by metal-organic chemical vapor deposition (MOCVD) operating at room temperature is presented. The details of the MOCVD growth procedure are given. The influence of p-type separating-barrier layer on dark current, photocurrent and response time was analyzed. Detectivity without immersion D* higher than 1 × 108 cmHz1/2/W was estimated for λPeak = 3.2 μm and 4.2 μm, respectively. A response time of τs ∼ 1 ns could be reached in both MW1 and MW2 ranges for the optimal P+ barrier Cd composition at the range 0.38–0.42, and extra series resistance related to the processing RSeries equal to 500 Ω.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call