Deep submicron parallel scanning probe lithography using two‐degree‐of‐freedom microelectromechanical systems actuators with integrated nanotips

Abstract

A new enabling technology for low-cost high throughput parallel scanning probe nanolithography is presented. Monolithic integration of microelectromechanical systems (MEMS) actuators with two-dimensional probe arrays as well as preliminary results in the simultaneous generation of multiple submicron patterns using such structures is reported. Two-degree-of-freedom electrothermal MEMS positioning structures integrated with nanoscale probe-tips are used to perform parallel scanning probe nanolithography circumventing the main deficiency of tip-based nanolithography, that is, low throughput. Simultaneous generation of multiple patterns scratched into 800 nm thick photoresist and 200 nm thick gold layers has been successfully demonstrated. Scratch marks as narrow and as long as ∼50 and 27 µm, respectively, have been generated in the X and Y directions using two different microactuator structures carrying 10 and 64 nanotips.