Abstract
Various preparation methods used for the fabrication of submillimeter-wave Pt/GaAs Schottky diodes are compared with respect to deep levels present in the diode surface region. In the samples prepared by the standard electron-beam evaporation process, three process-induced deep levels were detected with the concentrations in the range of 1013-1014 cm-3. On the other hand, these levels were very much reduced in the diodes produced by a new in-situ electrochemical technique. This appears to be related to the reported very low noise property of the latter diodes.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
