Abstract
“Ruby”, chromium-doped alumina thin films, have been deposited on single-crystal sapphire substrates. Using an atmospheric-pressure CVD system and a mixture of Cr(acac)3 and Al(acac)3 precursors resulted in poor color homogeneity and low growth. Carrying out the deposition in a low- pressure CVD system at 500 °C using a mixture of Al(acac)3, [Me2Al(μ-OiPr)]2, and Cr(acac)3 precursors produced a better color homogeneity and doubled the growth rate. Film quality was found to be strongly dependent on the thermal annealing conditions and was best when annealed at 1400 °C.
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