Abstract
The large-area Al-doped ZnO thin films are successfully deposited at room temperature on polycarbonate substrate using a 1500 mm dual cylindrical cathodes sputtering system. Those thin films have smooth surfaces (RMS: 9.6 nm) and lower thicknesses deviation (Uniformity: 98.6%) despite of high RF power. The optical transmittance properties of 3.13 wt% Al doped ZnO thin films have above 85% in visible region. A dual cylindrical cathodes sputtering system can fabricate transparent electrode on flexible electronic devices at room temperature for mass production of 6th generation solar cell and display industry.
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