Low-temperature preparation of transparent conductive Al-doped ZnO thin films by a novel sol–gel method

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We developed a novel sol–gel method to prepare transparent conductive Al-doped ZnO (AZO) thin film at low temperature. The AZO nanocrystals were prepared by a solvothermal method and then they were dispersed in the monoethanolamine and methanol to form AZO colloids. A (002)-oriented ZnO thin film was used as a nucleation layer to induce the (002)-oriented growth of AZO thin films. The AZO thin films were prepared on Si(100) and fused quartz glass substrates with the (002)-oriented ZnO nucleation layer and annealed at 400 °C for 60 min. All AZO thin films showed (002) orientation. For electrical and optical measurements, the films deposited on glass substrates were post-annealed at 400 °C for 30 min in forming gas (100 % H2) to improve their conductivity. These samples had high transparency in the visible wavelength range, and also showed good conductivity. A 0.2 mol L−1 AZO solution with 3 at.% Al content was heated in a Teflon autoclave at 160 °C for 30 min to form AZO nanocrystals, and then the AZO nanocrystals were suspended in the MEA and methanol to obtain the stable AZO colloid. The Al content in the AZO nanocrystals was 2.7 at.%, and the high Al doping coefficient was mainly attributed to the formation of AZO nanocrystals in the autoclave. The AZO thin film using this colloid had the lowest resistivity of 3.89 × 10−3 Ω cm due to its high carrier concentration of 3.29 × 1020 cm−3.