Abstract
The measurement of the thickness of titanium oxide layers by electron spectroscopy for chemical analysis is discussed on the basis of the angular distribution of photoelectrons. The conditions of analysis necessary to avoid secondary effects such as roughness or inhomogeneity of the oxide layer were determined. The growth of oxide layers is analysed using the low temperature oxidation model of Mott et al.; the influence of the pressure during oxidation on the thickness of the layers is related to the selectivity of the surface sites for the adsorption process; however, the influence of the method of preparation of the surface is still not well understood.
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