Abstract
Front Cover: A facile strategy by using atmospheric pressure dielectric barrier discharge (AP-DBD) with tetraethoxysilane (TEOS)/Ar/O2 as the source gas is employed for siloxane film deposition (upper). The composition of deposited siloxane film can be tuned by oxygen content in the working gas. The deposited siloxane film shows good stability and high surface resistivity, and reduces the odds of partial discharge, which is promising for power transmission application (below). Further details can be found in the article by Ruixue Wang et al. on 1600248.
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