Corrosion Inhibition Properties of Thiazolidinedione Derivatives for Copper in 3.5 wt.% NaCl Medium

Hassane Lgaz,Fatima Zahra Thari,Ismat Hassan Ali,Han-Seung Lee,Khalid Bougrin,Sourav Kr Saha,Namhyun Kang,Rachid Salghi,Khalid Karrouchi

doi:10.3390/met11111861

Abstract

Copper is the third-most-produced metal globally due to its exceptional mechanical and thermal properties, among others. However, it suffers serious dissolution issues when exposed to corrosive mediums. Herein, two thiazolidinedione derivatives, namely, (Z)-5-(4-methylbenzylidene)thiazolidine-2,4-dione (MTZD) and (Z)-3-allyl-5-(4-methylbenzylidene)thiazolidine-2,4-dione (ATZD), were synthesized and applied for corrosion protection of copper in 3.5 wt.% NaCl medium. The corrosion inhibition performance of tested compounds was evaluated at different experimental conditions using electrochemical impedance spectroscopy (EIS), potentiodynamic polarization curves (PPC) and atomic force microscopy (AFM). EIS results revealed that the addition of studied inhibitors limited the dissolution of copper in NaCl solution, leading to a high polarization resistance compared with the blank solution. In addition, PPC suggested that tested compounds had a mixed-type effect, decreasing anodic and cathodic corrosion reactions. Moreover, surface characterization by AFM indicated a significant decrease in surface roughness of copper after the addition of inhibitors. Outcomes from the present study suggest that ATZD (IE% = 96%) outperforms MTZD (IE% = 90%) slightly, due to the presence of additional –C3H5 unit (–CH2–CH = CH2) in the molecular scaffold of MTZD.

Highlights

Copper samples were polished with abrasive papers (400–2200) to a mirrorlike finish, cleaned with deionized water and ethanol, dried in the air stored in a vacuum desiccator for further use
It can be seen from the Nyquist as well as Bode plots presented in Figure 1 that there is a presence of two time constants and Warburg impedance
electrochemical impedance spectroscopy (EIS) results indicated that the addition of increasing concentration of inhibitors significantly increased the polarization resistance and decreased the double layer capacitance

Summary

Introduction

Copper and its alloys are prone to corrosion in aggressive environments such as hydrochloric acid and in saline conditions [8,9,10,11]. When exposed to such aggressive environments, copper has tendency to undergo severe corrosion damage, leading to a deterioration of appearance and performance. A number of organic inhibitors such as triazoles, Schiff bases, imidazoles, natural extract products and amino acids has been reported for the corrosion inhibition of copper and its alloys [2,12,13,14,15]

Methods

Results

Conclusion