Abstract

The redistribution and accumulation of oxygen vacancies under electric field underpins both the functionality and degradation of electrical and electrochemical devices comprising oxide layers. Interfacial accumulations of oxygen vacancies form defect dipoles, significantly reduce the breakdown strength, increase the breakdown path area, yet facilitates charge transfer reactions. Confinement of both oxygen vacancy redistributions and their mobility remains critical to preserving function in oxide systems.Here we study one of the most important, yet random transport processes: the redistribution of oxygen vacancies in binary oxides under high local electric fields. The ability to identify or predefine the shape, size, and location of vacancy distributions is critical to controlling interfacial properties of functional oxides. We achieved superior uniformity in HfO2 films by embedding highly-ordered metal nanoisland (NI) arrays to act as electric field concentrators. Embedded films exhibit significant reduction in operating voltages while displaying enhanced uniformity of resistance states. This behavior is attributed to the concentration of electric fields along Pt and Ti NIs and their interactions with the surrounding oxide film matrix environment, which induce separate and distinct filamentary formation mechanisms that affect the stability. A comparison of the density and distribution of the oxygen vacancies responsible driving filament dynamics is made via combined electrostatic force microscopy (EFM) and conductive atomic force microscopy (c-AFM) studies. Finally, the morphological evolution of conducting vacancy filaments is enabled by three-dimensional (3-D) c-AFM nanotomography and cross-sectional scanning transmission electron microscopy – energy dispersive spectroscopy (STEM-EDS) to provide direct correlations of nanoisland-oxide interactions with overall switching performance. The application of these exciting results to other vacancy-mediated electronic and electrochemical processes will also be discussed.

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