Abstract
Abstract Plating Solder bump is one of the key enabling technologies for flip chip assembly methodology. Flip chip assembly has advanced to support higher levels of interconnect and small feature sizes. Electroplating is a very promising technology for finer bump features when compared with solder printing and ball mounting. Hence, the plated-solder bump morphology is quite important for process quality control and design realization. This paper aims to study the plated solder behavior from as-plated mushroom structure to after reflowed bump stage photoresist sizing. In addition, this activity will consider the full bumping process integration relative to the electroplated solder bump design rules.
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