Abstract
A contact-type line image sensor using a semiinsulating Pb(2)CrO(5) thin film deposited on a glass substrate by an electron beam evaporation deposition technique is described. The sensor has a simple structure and a high scanning rate of 1 ms/line. An individual sensor element responds to light modulated at 100-kHz frequency, so a higher scanning rate is expected. A matrix driving method using a simple reading circuit is used to operate a sensor composed of 32 elements at a rate of 8 elements/mm. Some practical results on image reading are demonstrated.
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