Abstract
A Fourier-transform infrared phase-modulated spectroscopic ellipsometer (FT-IR PMSE) has been constructed by insertion of a grid polarizer as an analyzer in front of an infrared detector in addition to a conventional setup for phase-modulated reflection absorption spectroscopy (PMRAS). Although ellipsometric parameters Ψ and Δ are subject to the effect of mirrors placed between a photoelastic modulator and the analyzer, this can be canceled out in the derivation of optical density of the measured surface. The performance of the ellipsometer has been demonstrated in the characterization of thermally oxidized Si surfaces. It is shown that the imaginary part of the optical density spectrum has a higher signal-to-noise ratio than the real part, which corresponds to the spectrum obtained by PMRAS, and a linear relationship with SiO2 thickness. By this method the presence of a fluorinated layer has been detected on CF4 plasma-treated Si surface.
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