Comparison of TiZrV Non-Evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition

Abstract

Ti-Zr-V non-evaporable getter (NEG) films have been widely used in vacuum chambers of various accelerators since their discovery. Recently, we have used a new method called “quantitative deposition” to deposit Ti-Zr-V NEG films on nichrome substrates. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy. Although the film deposited by DC magnetron sputtering has more uniform grain growth, smoother grain boundaries and higher porosity, the two films all have porous network structure and can be used as getter films.