Testing the activation temperature of non-evaporable Ti-Zr-Hf-V getter films by XPS

Abstract

Developing new non-evaporable getter (NEG) films with low activation temperature is the key to developing next generation high-energy particle accelerators with the ultimate degree of chamber vacuum. Here, a quaternary alloy Ti-Zr-Hf-V getter film with a uniform thickness of 1.64μm is fabricated by DC magnetron sputtering. The activation temperature of the Ti-Zr-Hf-V getter film was detected by measuring the binding energy of Ti, Zr, Hf and V at different temperatures through in situ synchrotron radiation-based X-ray photoelectron spectroscopy. The Ti-Zr-Hf-V getter films are found to be activated at a temperature of 150 ∘C. In addition, the binding energy of Hf 4f at 130 ∘C is basically the same as that at 300 ∘C. The presence of the Hf element reduces the activation temperature of the obtained films.