Comparative Study of Nanocrystalline Diamond Deposition on WC–Ni and WC–Co Substrates

Abstract

Tungsten carbide alloys possess a large number of applications, due to its high hardness, high resistance to heat and to wear, which makes it ideal to be used in wear parts of machinery or on surfaces liable to corrosion, abrasion or high temperatures. For practical applications, it is alloyed with cobalt (Co) or nickel (Ni) in order to improve its properties. The increasing demand of broadening the operation limits of some components, impose the need to improve its life time. Coating these parts with hard and smooth diamond thin film may improve the wear performance and decrease their roughness and friction coefficient. In this work, a comparative study of nanodiamond films deposit onto WC-Co and WC-Ni, by means of a hot-filament Chemical Vapour Deposition (HFCVD) system, is presented. The study was accomplished by varying the CH4/H2/Ar gas ratio of the deposition process. The substrate temperature was kept low (< 700 degrees C) to minimize the thermal stress in the coating-substrate system. The microstructure of the deposited diamond film was characterized using Scanning Electron Microscopy (SEM), Raman spectroscopy and X-ray diffraction spectroscopy. Roughness of the working surfaces were also accessed prior and after the depositions.